ZEISS Semiconductor Manufacturing Technology enables microchip manufacturers worldwide to produce even smaller structures and thus more efficient microchips. Extreme ultraviolet lithography (EUV) realizes this by using light with a much shorter wavelength (13.5 nanometers) than previous lithography machines (shortest wavelength 193 nanometers).

Apr 1, 2025 · The EUV lithography optics from ZEISS's SMT segment project the finest structures of under 10 nanometers onto wafers – thin silicon discs – using light with extremely short wavelengths of 13.5 nanometers. These optical systems, which can be described as the most precise mirrors with mechatronic systems for maximum stability are a crucial ...

From 2026 onwards, ZEISS SMT will enable the semiconductor industry to produce the next microchip generation with its further development to High-NA-EUV lithography – thus supporting Moore's Law beyond the year 2030.

• Over the decades ZEISS has developed new AIMS™ generations to keep with the ongoing demands in mask making from i-line to EUV technology • More than 100 AIMS™ systems have been delivered to the industry during that time

Optics for EUV Lithography have evolved over three decades to a level where excellent imaging is demonstrated. Right now, the Starlith ® 3400 Optics extends EUV Lithography to 13nm single-shot resolution with high productivity for serial production. High-NA EUV Lithography enables further shrink for the

Delivery of more than 140 EUV systems with 0.33 NA at high and robust performance. More to come due to strong market pull. We are producing mirrors and frames for High-NA EUV optics at full speed. Build up of system integration tools is progressing.

Apr 1, 2025 · Die EUV-Lithographie-Optiken von ZEISS SMT bilden feinste Strukturen von unter 10 Nanometern auf den Wafern – dünnen Siliziumscheiben – mithilfe von Licht mit extrem kurzen Wellenlängen von 13,5 Nanometern ab. Diese optischen Systeme lassen sich als die präzisesten Spiegel mit mechatronischen Systemen für maximale Stabilität ...

EUV Optical Technology at Carl Zeiss SMT AG: has reached α-tool specs in key technology areas is progressing towards production tool capability

Dec 1, 2022 · To enable the future generations of chips, with even smaller feature sizes than what we currently have on the market, ZEISS and ASML are developing a new generation of EUV tools, where the numerical aperture (NA) of their optics is increased from the current 0.33 to 0.55.

High-NA EUV Optics – the Key for Miniaturization of Integrated Circuits in the Next Decade Bartosz Bilski, Heiko Feldmann, Paul Gräupner, Peter Kürz, Winfried Kaiser Carl Zeiss SMT GmbH, Germany [email protected] September 24 th, 2019 ESSCIRC/ESSDERC 2019, Cracow, Poland 1 of 43