JST’s Closed Loop Vapor IPA Dryer (CLV) is a patented ultra-clean IPA Drying technology designed and built to provide optimal wafer drying performance. It is available as a standalone system or integrated into a wet bench.

Wafer drying removes remaining watermarks and rinsing off any residues from previous process steps. RENA offers a broad spectrum of integrated and standalone wafer drying stations. We supply customers with a family of COMPASS spin rinse dryers (SRDs), patented Genesis Marangoni dryer and VaporDry.

RENA COMPASS Spin Rinse Dryers are premium wafer dryers that rinse off any residues left over from previous process steps and then dry the wafers. These platforms offers the most advanced features found in today’s SRDs.

Jan 1, 2008 · In this chapter, the performance of several drying techniques commonly used in the semiconductor manufacturing industry is evaluated. This is done by measuring the residues on a wafer onto which a solution containing metal salts acting as …

Delivering state-of-the-art semiconductor wet processing solutions, RENA provides wafer etching, cleaning, and stripping equipment designed to achieve industry-leading results. We manufacture a wide range of wet benches, from manual to semi-automated, and fully automated.

Modutek’s IPA Vapor Dryer offers efficient Marangoni drying for semiconductor wafers, reducing IPA use and ensuring clean, watermark-free drying.

Our originally developed wafer damage-less system eliminates the concerns about wafer cracking and pattern collapse in the spin drying to the utmost extent. This supports a wide range of workpiece sizes of 3 inches to 8 inches with thicknesses 150 µm to 725 µm.

Apr 20, 2021 · Modutek’s IPA vapor dryer incorporates rinsing and drying in a single station to reduce costs, save space, and minimize the handling of the silicon wafers. The station first rinses the wafers with de-ionized water and then introduces IPA vapor into the drying cabinet.

The Gradient Dryer processes a batch of 25 or 50 wafers in ~10-15 minutes depending on configuration. The dryers are configurable to accept one or two cassettes from 150mm to 300mm and can be produced as stand-alone units or integrated into wet processing stations.

The most adequate usage of Le Chatelier’s principle during the rinsing and drying procedure enables a precise control of wafer surface. Our Marangoni™ dryer is model NEO-2000-RD, gen.1.5. Our dHF Last, Rinse dryer is model NEO-3000-FRD, gen. 2.0.