EUV lithography does big things on a tiny scale. The technology, which is unique to ASML, prints microchips using light with a wavelength of just 13.5 nm – almost x-ray range. EUV is driving Moore’s Law forward and supporting novel transistor designs and chip architectures.

EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light.

Mar 30, 2022 · Four decades, billions in R&D, a vital merger, thousands of people around the world: bringing EUV lithography to high-volume manufacturing was an immense effort. Learn …

Jan 25, 2024 · What is High NA EUV lithography? High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.

The team at ASML San Diego designs, develops and qualifies the EUV (extreme ultraviolet) laser-produced plasma light source, and manufactures a critical system component called the droplet generator.

ASML acquired Cymer in 2013 to accelerate the development of extreme ultraviolet (EUV) semiconductor lithography. Based in San Diego, California, Cymer was founded in 1986 by two college friends Robert Akins and Richard Sandstrom to develop laser and lithography light source technology for the semiconductor industry.

Oct 22, 2021 · Three ASML engineers at the forefront of developing the EUV light source – a revolution in photolithography – have received the prestigious Leibinger international award.

By engineering the performance and reliability of droplet generation, Bob has played an important role in enabling a high-power EUV light source for commercial microchip production.

DUV lithography machines use lenses to focus light. But there are no lenses for EUV lithography. Since most materials absorb EUV light, the lenses would absorb the light in the system. Instead, we developed a brand-new optical system that uses ultrasmooth, multilayer mirrors inside a vacuum chamber.

Oct 17, 2012 · Combining Cymer’s expertise in EUV light sources with ASML’s expertise in lithography systems design and integration will reduce the risk and accelerate the introduction of this extremely complex technology.