The TWINSCAN NXE:3600D supports EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes. The TWINSCAN NXE:3600D combines imaging and overlay improvements with a 15% to 20% productivity improvement capability when compared to its predecessor, the NXE:3400C at dose 30mJ/cm2.

Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

The TWINSCAN NXE:3600D is ASML’s latest-generation lithography system, supporting EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes. 13.5 nm: EUV light wavelength, 13 nm: Resolution, 0.33 NA: Projection …

Sep 25, 2020 · High power laser interacts with liquid tin producing a plasma. Plasma is heated to high temperatures creating EUV radiation. Radiation is collected and used to pattern wafers. Over 10 independent variables can affect Target formation, giving a …

RAM node with systems deliveries and qualification on-going. EUV layers adopti.

Starlith 3600 ®: First delivery in August 2020 • Delivery of more than 140 EUV systems with 0.33 NA at high and robust performance. • More to come due to strong market pull. First Starlith 3600 ® Illuminator delivery

• Delivery of more than 140 EUV systems with 0.33 NA at high and robust performance. • More to come due to strong market pull. First Starlith ® 3600 Illuminator delivery

Closed loop dose performance is +/-0.35%. The work presented has been the result of a hard work by teams at ASML and many technology partners worldwide over many years with a common goal to make EUV lithography happen. in Europe - project, as …

Jun 24, 2022 · The 0.33 NA EUV systems are the production workhorse systems for leading edge lithography today. 0.33 NA systems are in high volume production for both logic and DRAM. Figure 1 illustrates the number of EUV layers for logic and …

Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.