SUSS's manual hot plate HP8 has been developed specifically to meet the requirements of R&D work and small scale production. The 200 mm hot plate (HP8) offers homogeneous temperature distribution as well as heating ramps with high repeating accuracy to ensure constant and …

SUSS HP8 manual wafer hot plate is designed for R&D work and small scale production up to 200mm wafers in table-top, bench mount or stand-alone versions.

SuSS microtec‘s manual hot plate HP8 has been developed specifically to meet the requirements of R&D work and small scale production. The 200 mm hot plate (HP8) offers homogen- eous temperature distribution as well as heating ramps with high repeating accuracy to ensure constant and stable process results.

SUSS 的手動熱板 HP8 專為滿足研發工作和小規模生產的要求而開發。 200 mm 熱板 (HP8) 提供均勻的溫度分佈以及重複精度高的加熱斜坡，以確保恆定和穩定的過程結果。 過專用觸摸屏控制器方便地進行控制。 如果與塗層和開發平台 RCD8 結合使用，可以選擇使用與 RCD8 相同的觸摸屏 PC 來控制 HP8。 桌面和工作台安裝版本在尺寸和外觀上都非常適合 SUSS LabSpin 系列。 不僅外形尺寸和控制可能性提供了高度的靈活性，而且各種可用選項（例如提升銷、接近烘烤和氮 …

SUSS MicroTec‘s manual hot plate HP8 has been developed specifically to meet the requirements of R&D work and small scale production. The 200mm hot plate (HP8) offers homogeneous temperature distribution as well as heating ramps with high repeating accuracy to ensure constant and stable process results.

半导体光刻工艺中最大8 寸基片光刻胶烘烤。 Resist baking to drive off solvents and to solidify the film.

SUSS MicroTec's manual hot plate HP8 has been developed specifically to meet the requirements of R&D work and small scale production. The 200 mm hot plate (HP8) offers homogeneous temperature distribution as well as heating ramps with high repeating accuracy to ensure constant and stable process results.

The 200 mm hot plate (HP8) offers homogeneous temperature distribution as well as heating ramps with high repeating accuracy to ensure constant and stable process results. plate surface by a micrometer, thus, giving a broad capability of processing options.

SUSS的手动热板HP8是专门为满足研发工作和小规模生产的要求而开发的。 200毫米的热板（HP8）提供均匀的温度分布和具有高重复精度的加热斜率，以确保恒定和稳定的工艺结果。 为了实现最佳的温度分布，SUSS HP8并不依赖传统的加热筒。 相反，数米长的加热线圈按照工艺证明的模式排列在底板内。 这就避免了热点或冷点，确保了均匀的温度分布。 热板有专门的涂层，以提高机械和化学耐受性，并易于清洁。 该工具有三种不同的外壳（台式、桌面和独立式）， …

SÜSS MicroTec develop and manufacture an extensive range of high-quality manual, semi-automatic and fully automatic wafer coating and developing equipment for lithographic processes used in the R&D and production of semiconductor and related devices.