This paper presents a technology update of key components of a 100W LPP-EUV (laser produced plasma extreme ultraviolet) light source for high volume manufacturing which enables sub-10nm critical layer patterning for semiconductor device fabrication.
100W EUV average power (105W stabilized, 95% duty) with 5% conversion efficiency (CE) for 5hours operation in September 2016 demonstrated. High conversion efficiency realized with several key engineering efforts. CO2 driver laser tests for 27kW started. Next target is >100W average power at high duty cycle with collector mirror.
Dipole-dipole attractive force from nano-sized sample absorption region is detected via AFM cantilever. IR PiFM combines IR spectroscopy with AFM to acquire topography and both IR absorption (PiF-IR) spectra and chemical map images with sub-10 nm spatial resolution.
Extreme ultraviolet (EUV) is established as a drive wavelength of a next generation lithography. We have been developing a 13.5nm wavelength, laser-produced-plasma (LPP) EUV light source, using tin (Sn) as a fuel and a high-power, pulsed CO2 laser as a plasma driver.
To develop a diagnostic system for laser-produced plasmas for extreme ultraviolet (EUV) light sources, collective laser Thomson scattering (LTS) was applied to laser-produced carbon plasmas to measure plasma parameters such as electron density (ne) and electron temperature (Te). →Dr. diagnostic system with errors below 10%.
Applications | Quantum cascade lasers (QCL) - Hamamatsu
Hamamatsu photonics offers appropriate components to perform Heterodyne detection: QCD which has MIR sensitivity and high response feature, high stable QCL, and CW controller with ultra-low noise characteristic.
Spectral characteristics of quantum-cascade laser operating at …
Nov 15, 2012 · Basic spectral performance characteristics of a custom-made QCL chip are measured, such as tuning range and chirp rate. The QCL is shown to have all essential qualities of a robust seed source for a high-repetition nanosecond …
QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for Laser ...
Mar 21, 2016 · In this Letter we describe in more detail a solid-state seeded, nanosecond pulse, multiline CO<sub>2</sub> oscillator designed and built for the extreme ultraviolet (EUV) laser-produced-plasma...
The oscillator employed quantum cascade laser (QCL) seeders, a spectral beam combiner and a diffusion-cooled, radio-frequency-discharge excited, slab-waveguide CO2 amplifier in a multi-pass and compact regenerative amplifier configuration.
This paper introduces key components technology update of 100W HVM LPP-EUV (laser produced plasma extreme ultraviolet) source which enable sub-10nm critical layer patterning. This light source system is composed of several key components and each has its innovating, key and original technology.