ASML’s TWINSCAN NXE:3800E is a dual-stage extreme ultraviolet (EUV) system that supports high-volume manufacturing of 2 nm Logic nodes and leading-edge DRAM nodes.

The TWINSCAN NXE:3600D supports EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes.

NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip …

Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability …

The TWINSCAN NXE:3400B supports EUV volume production at the 7 and 5 nm nodes. Combining productivity, excellent image resolution, matched overlay to EUV NXE and ArFi …

• EUV system sales reduced 9% to €8.3 billion, recognized revenue on 44 EUV systems (NXE & EXE) • Shipped and recognized revenue from multiple EXE:5000 systems and NXE:3800 …

Jun 28, 2023 · The Memorandum of Understanding signed today includes the installment and service of ASML’s full suite of advanced lithography and metrology equipment in the imec pilot …

Aug 18, 2021 · By 2016, chipmakers began ordering our first production-ready EUV system: the TWINSCAN NXE:3400. A dry runner Understandably, lithography technology innovation tends …

Feb 14, 2024 · I recently moved on to a new stage in my journey here, managing the entire NXE:3800 source that will be introduced to customers in 2024. But even now, I sometimes go …

The TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. Its 8 nm resolution will enable chipmakers to print with a single exposure features 1.7 times smaller – …