Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

In deep ultraviolet (DUV) lithography systems, those components are lenses; in extreme ultraviolet (EUV) systems, they’re mirrors. Each component must be correctly positioned to within a nanometer to ensure image quality.

EUV stands for "extreme ultraviolet" light. The light visible to humans has wavelengths between 400 and 800 nanometers. The range of ultraviolet light begins below 400 nanometers. The leading lithography process to date using "deep ultraviolet light" (DUV) operates at a wavelength of 193 nanometers.

Apr 6, 2023 · Extreme ultraviolet (EUV) radiation is a key technology for material science, attosecond metrology, and lithography. Here, we experimentally demonstrate metasurfaces as a superior way to focus EUV light.

Oct 20, 2021 · EUV stands for extreme ultraviolet light. With a wavelength of just 13.5 nanometers, structures can be created that are a tiny 15 nanometers in size – 5,000 times finer than a human hair.

Abstract: This presentation outlines design concepts for maskless and mask-projection (holographic) EUV lithography at wavelength 13.5 or 6.7 nm. See slide notes, page 21. Maskless EUVL can be implemented using conventional binary, zone-plate EUV lens technology, and conventional IBF mirror processing for achromatization.

Extreme Ultraviolet (EUV) Spherical Mirrors feature multilayer Mo/Si coatings just like the Extreme Ultraviolet (EUV) Flat Mirrors, but they utilize a curved substrate for focusing unpolarized EUV sources at a 5° angle of incidence.

Optics for EUV Lithography have evolved over three decades to a level where excellent imaging is demonstrated. Right now, the Starlith® 3400 Optics extends EUV Lithography to 13nm single-shot resolution with high productivity for serial production.

Dec 6, 2022 · At 13.5 nanometers, we enter the range of extreme ultraviolet radiation that is invisible to the human eye – hence the name EUV lithography. This technology increases transistor density enormously compared to current microchips. This is because the conductor paths created in this way are only a few nanometers wide.

High-NA extreme ultraviolet (EUV) lithography is currently in development. Fabrication of exposure tools and optics with a numerical aperture (NA) equal to 0.55 has started at ASML and Carl Zeiss.