Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

The Extreme Ultraviolet Limited Liability Company (EUV LLC) was formed in 1997 to advance the R&D for EUV lithography.

Mar 30, 2022 · Four decades, billions in R&D, a vital merger, thousands of people around the world: bringing EUV lithography to high-volume manufacturing was an immense effort. Learn about the pivotal moments that happened on the way to launching ASML’s first EUV system, as well as a glimpse of what’s next.

Apr 6, 2001 · EUV lithography technology is being developed to allow manufacturers to print circuit lines down to at least 0.03 microns, extending the current pace of semiconductor innovation at least through the end of this decade.

contribute additional benefits to the domestic economy. The EUV LLC Project, described below, provides a welcome opportunity to reassess these issues, to describe a new model for US-funded R&D projects that better defines US interests in the global economy.

Jun 24, 1999 · Lithographic stepper manufacturer ASM Lithography (ASML; Veldhoven, The Netherlands) has signed a contract with the Extreme Ultraviolet Limited Liability Co. (EUV-LLC) to participate in the EUV-LLC program. The EUV-LLC is a consortium to develop EUV wafer-fabrication technology.

Mar 26, 2001 · The EUV LLC is a consortium of chipmakers founded in 1997 that includes Intel, Advanced Micro Devices, Motorola, Micron Technology, Infineon Technologies and IBM, which announced its membership just a few weeks ago.

1997 the EUV Limited Liability Corporation (EUV LLC) consortium was formed and eventually expanded to include Intel,AMD, Motorola, Micron, Infineon and IBM. From 1997 to 2002, the EUV LLC program at Lawrence Berkeley, Lawrence Livermore, and Sandia National Laboratories achieved many significant milestones, including demonstrations of 100 nm ...

Dec 20, 2008 · The Extreme Ultraviolet Limited Liability Company (EUV LLC) was formed in 1997 to advance the R&D on EUV lithography (EUVL).

United States Advanced Lithography (USAL), a newly formed limited liability company led by Ultratech Stepper (San Jose, CA), has entered into a non-exclusive agreement with the Extreme Ultraviolet LLC (EUV LLC) to develop EUV lithography tools.