Mar 8, 2025 · China's domestic extreme ultraviolet (EUV) lithography development is far from a distant dream. The newest system, now undergoing testing at Huawei's Dongguan facility, leverages laser-induced discharge plasma (LDP) technology, representing a potentially disruptive approach to EUV light generation. ...

3 days ago · In just one year, China's EUV lithography machine was about to land. In addition to the dual work stage system, EUV equipment has two core technologies, namely the light source and the optical lens.

Mar 30, 2025 · China appears to be getting down to 3 nanometer chips even without EUV. The Chinese Academy of Sciences has recently developed a new technology that can emit 193nm deep ultraviolet (DUV) laser, achieving the ultra-fine level of 3nm production.

Mar 10, 2025 · Sadly, with ASML barred by U.S. trade sanctions from providing any Chinese entity with ‘state-of-the-art’ EUV machinery, the only possible route for the country’s experts is to produce in-house...

Mar 12, 2025 · Reports suggest that China is on track to produce its first domestically made EUV machines by 2025, with mass production projected for 2026. One of the companies at the forefront of this effort is Shanghai Micro Electronics Equipment (SMEE).

Mar 10, 2025 · However, those same customers could turn to Huawei as early as next year to get their EUV machine fix, as the Chinese giant hopes to break the ASML monopoly on the frontier of lithography for the first time. The plans for expansion in China are found in ASML’s annual report, as The Register writes. It is a striking turn of events, given that ...

Mar 11, 2025 · If China commercializes LDP-based EUV lithography, it could represent a major technological shift, cutting reliance on ASML and altering the global semiconductor landscape. However, challenges remain in scaling production, enhancing power output, and navigating Western trade restrictions.

5 days ago · 据最新消息，令人振奋的突破即将到来 —— 中国国产 EUV 光刻机预计在 2025 年第三季度进入试生产阶段，并有望在 2026 年实现大规模量产。 这一进展，无疑给中国半导体产业带来了新的希望。 中国国产 EUV 光刻机采用了独特的激光诱导放电等离子体（LDP）技术，这一技术与 ASML 的激光产生等离子体（LPP）技术存在显著差异。 LDP 技术的原理是通过在电极之间蒸发锡，利用高压放电将其转化为等离子体，在电子与离子的碰撞过程中产生波长为 13.5nm …

Sep 13, 2024 · Huawei filed an EUV system-related patent in China back in 2022. These patents mark an important milestone in China's push to develop independent semiconductor manufacturing capabilities.

Jan 24, 2025 · China’s scientists are pioneering new approaches in the development of extreme ultraviolet (EUV) lithography, aiming to enable the mass production of advanced semiconductor chips as they work to overcome stringent sanctions imposed by the United States.