Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.

Jan 25, 2024 · What is High NA EUV lithography? High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform, known as EXE, offers chipmakers a CD of 8 nm.

Jun 3, 2024 · The opening of the joint ASML-imec High NA EUV Lab represents a milestone in preparing High NA EUV for high-volume manufacturing – anticipated to happen in the 2025–2026 timeframe.

Mar 30, 2022 · The first shipments of EUV 0.55 ‘EXE’ machines to customers for R&D purposes are planned for the end of 2023, and we expect them to be used in high-volume manufacturing in 2025. But in 2022, our biggest challenge is ramping up production of EUV systems from 40 to around 60 systems per year.

ASML’s TWINSCAN NXE:3800E is a dual-stage extreme ultraviolet (EUV) system that supports high-volume manufacturing of 2 nm Logic nodes and leading-edge DRAM nodes.

EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light. EUV light occurs naturally in outer space. But to make EUV lithography possible, we needed to engineer a way to create such light within a system.

Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability complementary to ASML’s ArFi technology.

asmlは、世界で唯一、極紫外線(euv)を使った露光装置を製造する企業です。 EUVの力を利用した露光装置を実用化するため、ASMLは、過去20年以上にわたり粘り強く研究開発を続け、極めて困難な技術課題に取り組んできました。

The TWINSCAN NXE:3600D supports EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes.

Oct 17, 2012 · ASML’s six pre-production NXE:3100 EUV systems, capable of resolution performance compatible with the 22 nm node in single patterning mode, have exposed more than 23,000 wafers at customer sites with good overlay and imaging performance, enabling semiconductor device recipe development and confirmation of infrastructure progress.