Semantic Scholar profile for Tsann-Bim Chiou, with 9 highly influential citations and 31 scientific research papers.

Tsann-Bim CHIOU, Imaging scientist | Cited by 198 | of ASML, Veldhoven | Read 34 publications | Contact Tsann-Bim CHIOU

In this paper, firstly we developed various geometry-based sampling methods for both alignment and overlay corrections to evaluate correction robustness while keeping the number of sample fields as...

Mar 23, 2009 · In this paper, we studied the possibility of achieving <7nm overlay control in mass production by using CPE, Correction Per Exposure mode, and Intra-field high order correction (i-HOPC). CPE is one of the functions in GridMapper package, which is a method to apply correction for each exposure to compensate both systematic and random overlay errors.

In this paper, we studied the possibility of achieving <7nm overlay control in mass production by using CPE, Correction Per Exposure mode, and Intra-field high order correction (i-HOPC).

In this paper, we evaluated the High Order Process Correction (HOPC), Correction Per Exposure (CPE), High Order Wafer Alignment (HOWA) and High order intra-field Process Correction (i-HOPC)...

Read and download Optimization of alignment/overlay sampling and marker layout to improve overlay performance for double patterning technology by Chuei-Fu Chue, Tsann-Bim Chiou, Chun-Yen Huang, Alek C. Chen, Chiang-Lin Shih on OA.mg

Double patterning technology is capable of extending usability of immersion ArF systems for 32nm half-pitch node and below. However, overlay errors between the two patterning steps …

⮚ Develop the BIM models and all deliverables based on the information and data collected. This involves keeping the BIM models up-to-date and ensuring that all of the data is accurate and consistent.