EUV lithography does big things on a tiny scale. The technology, which is unique to ASML, prints microchips using light with a wavelength of just 13.5 nm – almost x-ray range. EUV is driving …

Jan 25, 2024 · We’re bringing you the what, why and how behind the TWINSCAN EXE:5000, ASML’s latest extreme ultraviolet (EUV) lithography system.

Mar 30, 2022 · Four decades, billions in R&D, a vital merger, thousands of people around the world: bringing EUV lithography to high-volume manufacturing was an immense effort. Learn …

The TWINSCAN NXE:3600D supports EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes.

EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light. EUV light occurs …

Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability …

Jun 3, 2024 · The opening of the joint ASML-imec High NA EUV Lab represents a milestone in preparing High NA EUV for high-volume manufacturing – anticipated to happen in the …

The TWINSCAN NXE:3600D supports EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes.

We have the largest ASML manufacturing site in Asia as well as two training centers, play an essential role in the rapidly growing e-beam market, and work closely with TSMC and major …

ASMLは、世界で唯一、極紫外線 (EUV)を使った露光装置を製造する企業です。 EUVの力を利用した露光装置を実用化するため、ASMLは、過去20年以上にわたり粘り強く研究開発を続け …