Demand for AI chips is growing exponentially, but costs and complexity limit the technology to a handful of companies. That ...

Wide field of view and light weight optics are critical for advanced eyewear, with applications in augmented/virtual reality and night vision. Conventional refractive lenses are often stacked to ...

Now high NA lithography can achieve nearly three times greater feature density, critical for IC device nodes of 2nm and smaller. Although NA EUV is enabling tighter resolution, the anamorphic imaging ...

Dry resist improves EUV lithography resolution, lowers costs, reduces defects, improves productivity, and uses less energy and raw materials than traditional resist processes, thus making it more ...

Back at CES, we reported on the new LG UltraGear 45GX950A. It's a 45-inch OLED gaming monitor with a 5K2K resolution that ...

A major breakthrough with Aether® technology enhances EUV lithography by improving resolution and yield while offering ...

On the other hand, sales of FPD Lithography Systems for high-resolution panels increased by 15 units from the previous year to 26 units. The Precision Equipment Business as a whole saw a decline in ...

One major category of the next generation of energy-efficient microelectronic devices and information processing technologies ...

Beijing recently advised state-linked organizations to use a new homemade lithography machine with a resolution of 65nm or better — far from the 8nm resolution of ASML’s best machines.

MAPPER’s technology makes use of massively parallel electron beams (up to 13,000 beams in a full production system), thereby coupling the very high resolution and depth of field of electron beam with ...