Multi-layer high-K metal gate (HKMG) film stacks require the adoption of a feedforward process.
International Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), Tsukuba 305-0044, Ibaraki, Japan ...
Ellipsometry and reflectometry are optical measurement techniques used for surface analysis and thin-film characterization. 1 Both methods rely on light reflection but differ in their approach.
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