Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...

The ALD product line includes a variety of instruments to satisfy different needs of small-scale manufacturing, corporate R&D, and academia. There is a substantial process library at Oxford ...

Evaluating multilayer coatings for neural implants, this study finds hafnium-based ALD layers excel in biostability, ensuring ...

In addition to our cluster tool, ALD center Finland houses 12 smaller ALD/ALEt tools for thin film deposition and ALD/ALEt process development studies. The center has solid knowhow of hundreds of ALD ...

ALD allows for the deposition of materials at ... and film thickness significantly influence the crystallization process and the resulting optical and electrical properties of the films[1].