Demand for AI chips is growing exponentially, but costs and complexity limit the technology to a handful of companies. That ...

Wide field of view and light weight optics are critical for advanced eyewear, with applications in augmented/virtual reality and night vision. Conventional refractive lenses are often stacked to ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

The significantly smaller wavelength of electrons compared to light allows for higher resolution patterning, enabling the creation of features that can be smaller than 10 nanometers. The EBL process ...

Inspired by a super-resolution microscopy technique known as STED ... The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work focuses on adapting this ...

with a resolution down to several tens of nanometres. An extension of this technology could be an alternative option for next-generation, sub-13.5-nm lithography. Many of the technical issues ...

soft lithography employs elastomeric materials, typically polydimethylsiloxane (PDMS), to create patterns and structures with high fidelity and resolution. This versatile technique enables the ...

low resolution, high energy consumption, low light efficiency, and insufficient optical power density. To overcome these challenges, the research team built a maskless lithography prototype ...

Computational lithography uses various techniques of resolution enhancement technology (RET) to create more perfect images on the chip as the elements of the transistor get smaller and smaller.