Intel has taken an early lead in High-NA EUV lithography, but widespread adoption remains constrained by high tool costs, ...

Rapidus has successfully begun installing ASML's Twinscan NXE:3800E EUV lithography system at its ... of over 220 wafers per hour at a 30 mJ/cm² dose. The system — which weighs 71 tonnes ...

With single-patterning EUV, the goal is to print features with tight pitches. This requires a robust EUV resist with the right sensitivity and dose. “Dose is the amount of energy (per unit area) that ...

Resist sensitivity limits the throughput of an EUV exposure system, and is therefore a major contributor to the overall process cost. Irresistible Materials CEO Dinesh Bettadapur estimated that ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

The company maintains a near-monopoly on extreme ultraviolet (EUV) lithography, which is essential for producing advanced chips at 3nm and below. Its EUV systems are crucial for leading chipmakers ...

We are specialists in contamination control research. We develop instrumentation and strategies for applications with the most challenging requirements in the High Tech Industry, including EUV ...