Chinese electronics giant Huawei is testing elements for an extreme ultraviolet (EUV) lithography machine at its Dongguan facility, according to two sources posting photographs on X social media. The ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

CD-SEM plays a crucial role in lithography process control, particularly in advanced patterning techniques such as extreme ultraviolet (EUV) lithography and directed self-assembly (DSA). In EUV ...