A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by Lawrence Livermore National Laboratory (LLNL), the project aims ...

ASML to quintuple Japan-based maintenance staff for machines, as Japan boosts its semiconductor technology position through ...

Rapidus has successfully begun installing ASML's Twinscan NXE:3800E EUV lithography system at its ... Second, Rapidus aims to automate chip packaging, thus shrinking cycle times.

In order to develop the 1nm process next-generation equipment will be required, including High-NA EUV lithography machines.

Samsung Electronics starts the development process of its future-gen 1nm process node, calls it the 'dream semiconductor process' to battle TSMC and Intel.

The semiconductor industry is rethinking the manufacturing flow for extreme ultraviolet (EUV) lithography in an effort to improve the overall process and reduce waste in the fab. Vendors currently are ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

In EUV lithography, and especially high-numerical-aperture EUV, balancing tradeoffs between resolution, sensitivity and line-width roughness is becoming increasingly difficult. Lithography patterning ...