ALD is based on sequential surface chemical reactions and is self-liming; therefore, it is an ideal technique to deposit conformal, uniform films with angstrom-level control on the surfaces of ...

A new technical paper titled “Large-area synthesis of high electrical performance MoS 2 by a commercially scalable atomic layer deposition process” by researchers at the University of Southampton, LMU ...

Pt doping on TiO2 nanoparitlces is through ALD method. When the ALD process and situation is different, the Pt improvement effect to TiO2 photoactivity is different.