With 13.5 nm EUV technology coming to maturity ... but these will probably have a maximum reflectivity of around 40%, compared with 72% for the Mo/Si mirrors used at 13.5 nm.

Grenoble, France – April 9, 2018 -- Dolphin Integration, leader in innovative design solutions for the next generation of Energy-Efficient System-on-Chips, augments TSMC’s IP ecosystem at 40 nm with ...

Grenoble, France – November 9, 2012-- Dolphin Integration has rolled out at 40 nm their offering of mixed signal Audio Codec based on the high-End Xenon architecture. It confirms their position as the ...

With EUV, the wavelengths of the lithography printers are 14 times smaller than DUV, at only 13.5 nm, compared to 193 nm of ArF immersion DUV systems... As an example, Intel tried to use SAQP in ...